Lithographic apparatus and device manufacturing method

United States of America Patent

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Jun 21, 2011
Grant Date
Nov 1, 2007
app pub date
Feb 8, 2007
filing date
Oct 18, 2004

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Abstract

Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.

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ASML NETHERLANDS B.V.

International Classification(s)

G03B:APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS O....

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Inventor Name	Address	# of filed Patents	Total Citations
Bleeker, Arno Jan	Westerhoven, NL	99	2905
Troost, Kars Zeger	Waalre, NL	33	477

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Lithographic apparatus and device manufacturing method

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United States of America Patent

11703823

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PATENT NO	7965380
APP PUB NO	20070252967A1
SERIAL NO	11703823
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
June 21, 2011	US,7965380,B2 US7965380B2	GRANTED PATENT AS SECOND PUBLICATION
November 01, 2007	US,20070252967,A1 US20070252967A1	FIRST PUBLISHED PATENT APPLICATION

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11703823

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