Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma
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United States of America Patent
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Jun 28, 2011
Grant Date -
Nov 6, 2008
app pub date -
Dec 22, 2004
filing date -
Dec 22, 2003
priority date (Note) -
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Abstract
The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.
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