Device having thin black mask and method of fabricating the same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 28, 2011
Grant Date -
Oct 15, 2009
app pub date -
Apr 10, 2008
filing date -
Apr 10, 2008
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A thin black mask is created using a single mask process. A dielectric layer is deposited over a substrate. An absorber layer is deposited over the dielectric layer and a reflector layer is deposited over the absorber layer. The absorber layer and the reflector layer are patterned using a single mask process.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully