High-index UV optical materials for immersion lithography
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United States of America Patent
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Jul 5, 2011
Grant Date -
Mar 6, 2008
app pub date -
Aug 29, 2007
filing date -
Aug 30, 2006
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Abstract
where x=0 to 1 as the high-index UV transparent material for immersion lithography. The LMAO body may include a disordered spinel, such as, for example, a single crystal that may be cubic in symmetry, optically isotropic, and having cation disorder within the structure to reduce the intrinsic birefringence (IBR). The LMAO body has certain desired material properties and may be readily made in relatively large sizes suitable for use as the UV optical element for photolithography.
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