System for extraction of key process parameters from fault detection classification to enable wafer prediction

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United States of America Patent

PATENT NO 7974728
APP PUB NO 20080275585A1
SERIAL NO

12026361

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Abstract

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A system, method, and computer readable medium for extracting a key process parameter correlative to a selected device parameter are provided. In an embodiment, the key process parameter is determined using a gene map analysis. The gene map analysis includes grouping highly correlative process parameter and determining the correlation of a group to the selected device parameter. In an embodiment, the groups having greatest correlation to the selected device parameter are displayed in a correlation matrix and/or a gene map.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDHSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ko, Francis Taichung, TW 19 313
Lin, Chun-Hsien Hsinchu, TW 286 2079
Lo, Henry Hsinchu, TW 36 387
Wang, Jean Hsin-Chu, TW 41 1262
Zuo, Kewei Taipei County, TW 23 570

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