Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same
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United States of America Patent
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Jul 26, 2011
Grant Date -
Sep 10, 2009
app pub date -
Feb 24, 2009
filing date -
Mar 5, 2008
priority date (Note) -
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Abstract
An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate compound in addition to water.
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