Polysilazane, method of synthesizing polysilazane, composition for manufacturing semiconductor device, and method of manufacturing semiconductor device using the composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 2, 2011
Grant Date -
May 6, 2010
app pub date -
Mar 31, 2009
filing date -
Nov 5, 2008
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Disclosed are polysilazane, a method of synthesizing the polysilazane, a composition for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using the composition. The polysilazane is synthesized through a reaction, under a catalyst, between dichlorosilane, trichlorosilane, and ammonia added in a reaction solvent as a reactant. In this instance, a polystyrene conversion weight average molecular weight of the polysilazane is about 2,000 to 30,000.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully