Projection exposure system, beam delivery system and method of generating a beam of light

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United States of America Patent

PATENT NO 7995280
APP PUB NO 20080225921A1
SERIAL NO

11792099

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Abstract

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, and wherein an optical delay apparatus disposed in the beam provides an optical path difference Δl, whereinrepresents the second line width.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT AGRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Davydenko, Vladimir Oberkochen, DE 29 94
Fiolka, Damian Oberkochen, DE 116 2064
Kuss, Matthias Sinningen, DE 3 22
Maul, Manfred Aalen, DE 79 993
Reisinger, Gerd Oberkochen, DE 10 102

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