Lithographic apparatus and device manufacturing method for writing a digital image
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United States of America Patent
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Aug 23, 2011
Grant Date -
Aug 19, 2010
app pub date -
May 6, 2010
filing date -
Jun 8, 2005
priority date (Note) -
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Abstract
A device manufacturing method is provided. The method includes generating a first patterned beam, projecting the first patterned beam onto a substrate to form a first plurality of spot exposures on the substrate, scanning the substrate in a direction while projecting the first patterned beam, generating a second patterned beam, projecting the second patterned beam onto the substrate to form a second plurality of spot exposures on the substrate, and alternating spot exposures of the first plurality of spot exposures with respective spot exposures of the second plurality of spot exposures.
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