Template having alignment marks formed of contrast material

United States of America Patent

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Sep 6, 2011
Grant Date
Oct 8, 2009
app pub date
May 12, 2009
filing date
Apr 18, 2006

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Abstract

Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.

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CITIBANK N A	390 GREENWICH STREET NEW YORK NY 10013

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B28B:SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG O....

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[Patents Count]

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Inventor Name	Address	# of filed Patents	Total Citations
Choi, Byung-Jin	Austin, US	194	2163
McMackin, Ian Matthew	Austin, US	20	191
Schmid, Gerard M	Austin, US	35	341
Selinidis, Kosta S	Austin, US	24	198
Thompson, Ecron D	Round Rock, US	12	251

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Template having alignment marks formed of contrast material

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12464487

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PATENT NO	8012395
APP PUB NO	20090250840A1
SERIAL NO	12464487
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
September 06, 2011	US,8012395,B2 US8012395B2	GRANTED PATENT AS SECOND PUBLICATION
October 08, 2009	US,20090250840,A1 US20090250840A1	FIRST PUBLISHED PATENT APPLICATION

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12464487

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