US Patent No: 8,027,021

Number of patents in Portfolio can not be more than 2000

Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method

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ALSO PUBLISHED AS: 20080043212
ATTORNEY / AGENT: (SPONSORED)
 

Importance

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Abstract

Position information of a movable body within an XY plane is measured with high accuracy by an encoder system whose measurement values have favorable short-term stability, without being affected by air fluctuations, and also position information of the movable body in a Z-axis direction orthogonal to the XY plane is measured with high accuracy by a surface position measuring system, without being affected by air fluctuations. In this case, since both of the encoder system and the surface position measuring system directly measure the upper surface of the movable body, simple and direct position control of the movable body can be performed.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
NIKON CORPORATIONTOKYO6788

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shibazaki, Yuichi Kumagaya, JP 181 406

Cited Art

Patent Info (Count) # Cites Year
 
ASML NETHERLANDS B.V. (33)
5,969,441 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device 396 1997
6,819,425 Lithographic apparatus, device manufacturing method, and device manufactured thereby 26 2001
6,778,257 Imaging apparatus 125 2002
6,952,253 Lithographic apparatus and device manufacturing method 132 2003
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7,102,729 Lithographic apparatus, measurement system, and device manufacturing method 20 2004
7,289,212 Lithographic apparatus, device manufacturing method and device manufacturing thereby 20 2004
7,256,871 Lithographic apparatus and method for calibrating the same 15 2004
2005/0128,461 Lithographic apparatus and device manufacturing method, and measurement systems 16 2004
2006/0139,595 Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness 12 2004
7,349,069 Lithographic apparatus and positioning apparatus 12 2005
7,161,659 Dual stage lithographic apparatus and device manufacturing method 35 2005
7,405,811 Lithographic apparatus and positioning apparatus 9 2005
7,292,312 Lithographic apparatus and method for calibrating the same 14 2005
7,348,574 Position measurement system and lithographic apparatus 13 2005
2006/0227,309 Lithographic apparatus and device manufacturing method 29 2005
7,362,446 Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit 19 2005
2007/0076,218 Lithographic apparatus temperature compensation 14 2005
2006/0139,660 Lithographic apparatus, device manufacturing method and device manufactured thereby 17 2005
7,333,174 Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness 11 2005
7,602,489 Lithographic apparatus and device manufacturing method 9 2006
7,253,875 Lithographic apparatus and device manufacturing method 8 2006
7,636,165 Displacement measurement systems lithographic apparatus and device manufacturing method 11 2006
7,483,120 Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method 11 2006
2007/0052,976 Position measurement system and lithographic apparatus 16 2006
7,619,207 Lithographic apparatus and device manufacturing method 7 2006
2008/0240,501 Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object 7 2007
7,710,540 Lithographic apparatus and device manufacturing method 7 2007
7,408,655 Lithographic apparatus and method for calibrating the same 9 2007
7,528,965 Lithographic apparatus and method for calibrating the same 8 2007
2008/0074,681 Lithographic apparatus and method for calibrating the same 13 2007
7,859,686 Lithographic apparatus and method for calibrating the same 6 2009
7,880,901 Lithographic apparatus and method for calibrating the same 6 2010
 
NIKON CORPORATION (13)
4,465,368 Exposure apparatus for production of integrated circuit 92 1981
4,780,617 Method for successive alignment of chip patterns on a substrate 193 1986
5,448,332 Exposure method and apparatus 162 1994
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2008/0088,843 Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method 24 2007
 
CANON KABUSHIKI KAISHA (5)
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5,166,754 Alignment system 15 1992
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5,610,683 Immersion type projection exposure apparatus 521 1995
6,819,433 Exposure apparatus including interferometer system 23 2002
 
HITACHI, LTD. (2)
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5,715,039 Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns 394 1996
 
ASML HOLDING N.V. (1)
7,025,498 System and method of measuring thermal expansion 17 2003
 
ASML US, LLC (1)
6,611,316 Method and system for dual reticle image exposure 80 2002
 
FUJI PHOTO FILM CO., LTD. (1)
2005/0271,421 Calibration method for exposure device, exposure method and exposure device 2 2005
 
MERCOTRUST AKTIENGESELLSCHAFT, A CORP. OF LIECOTENSTEIN (1)
4,346,164 Photolithographic method for the manufacture of integrated circuits 483 1980
 
NIKON PRECISION INC. (1)
5,825,043 Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus 498 1996
 
SONY CORPORATION (1)
5,247,165 Displacement detecting apparatus using graduated linear scale 18 1992
 
TOKYO ELECTRON LIMITED (1)
2006/0231,206 Exposure apparatus and device manufacturing method 38 2006
 
U.S. PHILIPS CORPORATION (1)
6,208,407 Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement 186 1998
 
XOMA TECHNOLOGY LTD. (1)
5,693,493 Modular assembly of antibody genes, antibodies prepared thereby and use 31 1995

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
MEDICAL THERAPIES LIMITED (1)
8,106,009 Pharmaceutical composition for preventing or treating ischemic diseases 0 2003

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