Systems and methods for forming metal oxides using metal diketonates and/or ketoimines
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United States of America Patent
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Oct 11, 2011
Grant Date -
Apr 22, 2010
app pub date -
Dec 23, 2009
filing date -
Aug 28, 2002
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Abstract
A method of forming (and an apparatus for forming) a metal oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process and one or more precursor compounds that include diketonate ligands and/or ketoimine ligands.
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