Method and apparatus for an improved baffle plate in a plasma processing system

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Nov 15, 2011
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Sep 6, 2007
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May 7, 2007
filing date
Sep 30, 2002

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Abstract

The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.

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TOKYO ELECTRON LIMITED	3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor Name	Address	# of filed Patents	Total Citations
Mitsuhashi, Kouji	Nirasaki, JP	38	1111
Nakayama, Hiroyuki	Nirasaki, JP	238	3061
Nishimoto, Shinya	Nirasaki, JP	22	460

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Method and apparatus for an improved baffle plate in a plasma processing system

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United States of America Patent

11745185

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PATENT NO	8057600
APP PUB NO	20070204794A1
SERIAL NO	11745185
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
November 15, 2011	US,8057600,B2 US8057600B2	GRANTED PATENT AS SECOND PUBLICATION
September 06, 2007	US,20070204794,A1 US20070204794A1	FIRST PUBLISHED PATENT APPLICATION

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11745185

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