Silver layer formed by electrosilvering substrate material
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United States of America Patent
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Nov 22, 2011
Grant Date -
Jan 10, 2008
app pub date -
Jul 5, 2007
filing date -
Jul 6, 2006
priority date (Note) -
Expired
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Abstract
The inventors have conducted vigorous studies, and discovered as a result that it is possible to form a silver layer having a high reflectance of about 90 to 99% in a visible light area by setting a grain size of an outermost surface of a silver plated layer within a range of 0.5 μm or more to 30 μm or less.
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