Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
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United States of America Patent
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Nov 29, 2011
Grant Date -
Feb 17, 2005
app pub date -
Jul 22, 2004
filing date -
Feb 14, 2002
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Abstract
. The coatings are typically applied to a surface of an aluminum alloy substrate or an anodized aluminum alloy substrate using a technique selected from the group consisting of thermal/flame spraying, plasma spraying, sputtering, and chemical vapor deposition (CVD). To provide the desired corrosion resistance, it is necessary to place the coating in compression. This is accomplished by controlling deposition conditions during application of the coating.
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