Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin

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United States of America Patent

PATENT NO 8080363
APP PUB NO 20090239176A1
SERIAL NO

12207345

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Abstract

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A resin to be added to a resist composition and locally distributed on a resist film surface to hydrophobitize the resist film surface includes a residual monomer in an amount of 1 mass % or less to the resin as a whole in terms of solid content.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kanda, Hiromi Shizuoka, JP 50 897

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