Embossing process including discrete and linear embossing elements
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United States of America Patent
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Dec 27, 2011
Grant Date -
Dec 11, 2008
app pub date -
Jul 11, 2008
filing date -
Jun 8, 2005
priority date (Note) -
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status (Latency Note)
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Abstract
A method for producing a deep-nested embossed product is disclosed. The method comprises the steps of: a) providing an embossing apparatus having mating first and second embossing members; b) providing the first embossing member with a plurality of discrete embossing elements in a non-random pattern; c) providing the second embossing member with at least one linear embossing element; d) coordinating the at least one linear embossing element with the non-random pattern of first embossing elements; e) aligning the first embossing member and the second embossing member so that the non-random pattern of first embossing elements nest with the at least one linear embossing element to an engagement depth of greater than about 0.01 mm; f) providing one or more plies of material to the embossing apparatus; and, g) passing the one or more plies of the material between the first and second embossing members to produce the deep-nested embossed product.
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