Zirconium silicon oxide films
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United States of America Patent
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Dec 27, 2011
Grant Date -
Sep 11, 2008
app pub date -
May 20, 2008
filing date -
Apr 28, 2005
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Abstract
Electronic apparatus and systems include structures having a dielectric layer containing a zirconium silicon oxide film. A zirconium silicon oxide film may be disposed in an integrated circuit, as well as in a variety of other electronic devices. Additional apparatus, systems, and methods are disclosed.
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