Electromigration resistant aluminum-based metal interconnect structure

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United States of America Patent

PATENT NO 8084864
APP PUB NO 20110221064A1
SERIAL NO

13114342

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Abstract

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liner, the aluminum portion, and the metal nitride cap. The effect of enhanced electromigration resistance may be more prominent in areas in which the metal nitride cap suffers from erosion during processing.

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Patent Owner(s)

Patent OwnerAddress
ALSEPHINA INNOVATIONS INC303 TERRY FOX DRIVE SUITE 300 OTTAWA K2K 3J1

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chapple-Sokol, Jonathan D Essex Junction, US 23 1194
Delibac, Daniel A Colchester, US 7 26
He, Zhong-Xiang Essex Junction, US 178 1825
Lee, Tom C Essex Junction, US 80 1171
Murphy, William J North Ferrisburgh, US 170 2504
Sullivan, Timothy D Underhill, US 138 1740
Thomas, David C Richmond, US 36 720
Vanslette, Daniel S Fairfax, US 24 129

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