Microlithographic projection exposure apparatus illumination optics

United States of America Patent

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Dec 27, 2011
Grant Date
Jan 17, 2008
app pub date
Jul 13, 2007
filing date
Jul 14, 2006

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Abstract

Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

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Patent Owner(s)

Patent Owner	Address
CARL ZEISS SMT AG	RUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

G03B:APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS O....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Kohl, Alexander	Huettlingen, DE	37	484

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Microlithographic projection exposure apparatus illumination optics

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United States of America Patent

11777845

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PATENT NO	8085382
APP PUB NO	20080013065A1
SERIAL NO	11777845
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
December 27, 2011	US,8085382,B2 US8085382B2	GRANTED PATENT AS SECOND PUBLICATION
January 17, 2008	US,20080013065,A1 US20080013065A1	FIRST PUBLISHED PATENT APPLICATION

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11777845

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