Electron reflector with multiple reflective modes
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United States of America Patent
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Jan 3, 2012
Grant Date -
Aug 25, 2011
app pub date -
Feb 24, 2010
filing date -
Feb 24, 2010
priority date (Note) -
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status (Latency Note)
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Abstract
One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.
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