Lithographic apparatus and device manufacturing method
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United States of America Patent
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-
Jan 3, 2012
Grant Date -
Apr 30, 2009
app pub date -
Sep 25, 2008
filing date -
Sep 28, 2007
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A lithographic apparatus comprises an immersion fluid system and an interferometric temperature detection system. The immersion fluid system is configured to provide immersion fluid to an exposure system. The interferometric temperature detection system is configured to measure a temperature of the immersion fluid.
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