Method and apparatus for reviewing defects

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United States of America Patent

PATENT NO 8090190
APP PUB NO 20100128970A1
SERIAL NO

12695090

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Abstract

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An apparatus for reviewing defects including an image processing section (defect classification device section) with a function of estimating a non-defective state (reference image) of a portion in which the defect exists by use of a defect image, and a function of judging criticality or non-flat state of the defect by use of the estimation result. It becomes possible to establish both of a high-throughput image collecting sequence in which any reference image is not acquired and high-precision defect classification, and then to realize both of a high performance classifying function and a high-throughput image collecting function in a defect reviewing apparatus which automatically collects and classifies images of defects existing on a sample of a semiconductor wafer or the like.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH CORPORATION17-1 TORANOMON 1-CHOME MINATO-KU TOKYO 1056409 ?1056409

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honda, Toshifumi Yokohama, JP 130 1458
Nakagaki, Ryo Kawasaki, JP 57 832

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