Method for defect diagnosis and management

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United States of America Patent

PATENT NO 8095895
APP PUB NO 20100180239A1
SERIAL NO

12318974

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Abstract

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A method for defect diagnosis and management, which is implemented in a process for fabricating an article, comprising the following steps: obtaining an inspection image of the article, wherein the inspection image shows at least one defect of the article; retrieving a design layout corresponding to the inspection image, wherein the design layout has a plurality of conductive regions; matching the inspection image and the design layout for correcting the coordinates of the defect on the design layout; and judging the overlaps of the conductive regions so as to obtain a short failure if the defect covers two conductive regions, obtain a open failure if the defect intercepts one of conductive region, or obtain no failure if the defect overlaps one of conductive region but not intercepts or covers another conductive region.

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Patent Owner(s)

Patent OwnerAddress
ELITE SEMICONDUCTOR INCNO 195 CHUNG HSING ROAD CHUTING HSINCHU 31040

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Leu, Iyun Hsinchu, TW 19 134

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