Short path customized mask correction
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United States of America Patent
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Jan 31, 2012
Grant Date -
Jul 22, 2010
app pub date -
Jan 19, 2009
filing date -
Jan 19, 2009
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Embodiments of the present invention provide a method of performing photo-mask correction. The method includes identifying a hot-spot in a photo-mask that violates one or more predefined rules; creating a window area in the photo-mask that surrounds the hot spot; categorizing the window area; selecting a solution, from a library of pre-computed solutions, based on a category of the window area; and applying the solution to the hot spot. A service-oriented architecture (SOA) system that synchronizes the design to the process is also provided.
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