Method of mask forming and method of three-dimensional microfabrication
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United States of America Patent
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Feb 7, 2012
Grant Date -
Jun 10, 2010
app pub date -
Apr 25, 2005
filing date -
Apr 25, 2005
priority date (Note) -
Expired
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Abstract
(0≦X≦1, 0≦Y≦1, 0≦Z≦1), which is a method for forming a mask with a minute width suitable for microfabrication in nano-order.has been irradiated is partially removed by heating while alternatively carrying out a rise and fall in heating temperature.
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