Method of manufacturing a display device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8119189
APP PUB NO 20010006827A1
SERIAL NO

09747731

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An apparatus for forming a film having high uniformity in its film thickness distribution is provided. An evaporation source is used in which an evaporation cell, or a plurality of evaporation cells, having a longitudinal direction is formed, and by moving the evaporation source in a direction perpendicular to the longitudinal direction of the evaporation source, a thin film is deposited on a substrate. By making the evaporation source longer, the uniformity of the film thickness distribution in the longitudinal direction is increased. The evaporation source is moved, film formation is performed over the entire substrate, and therefore the uniformity of the film thickness distribution over the entire substrate can be increased.

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Patent Owner(s)

Patent OwnerAddress
SEMICONDUCTOR ENERGY LABORATORY CO LTDJAPAN'S KANAGAWA PREFECTURE ATSUGI CITY ATSUGI-SHI KANAGAWA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukunaga, Takeshi Kanagawa, JP 231 14991
Yamazaki, Shunpei Tokyo, JP 7534 239327

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