Apparatus for cyclical depositing of thin films

United States of America Patent

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Feb 28, 2012
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Mar 5, 2009
app pub date
Oct 30, 2008
filing date
Jan 25, 2002

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Abstract

An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.

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APPLIED MATERIALS INC	3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor Name	Address	# of filed Patents	Total Citations
Al-Shaikh, Ayad A	Santa Clara, US	3	120
Gelatos, Avgerinos V	Redwood City, US	94	3259
Glenn, Walter Benjamin	Pacifica, US	10	1749
Khan, Ahmad A	Milpitas, US	5	229
Mak, Alfred W	Union City, US	43	4011
Thakur, Randhir P S	San Jose, US	241	5412
Umotoy, Salvador P	Antioch, US	45	11170
Xi, Ming	Palo Alto, US	101	11215

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Apparatus for cyclical depositing of thin films

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12261487

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PATENT NO	8123860
APP PUB NO	20090056626A1
SERIAL NO	12261487
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
February 28, 2012	US,8123860,B2 US8123860B2	GRANTED PATENT AS SECOND PUBLICATION
March 05, 2009	US,20090056626,A1 US20090056626A1	FIRST PUBLISHED PATENT APPLICATION

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12261487

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