Method for forming metal film by ALD using beta-diketone metal complex
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United States of America Patent
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Mar 13, 2012
Grant Date -
Apr 15, 2010
app pub date -
Oct 14, 2008
filing date -
Oct 14, 2008
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Abstract
A method of forming a single-metal film on a substrate by plasma ALD includes: contacting a surface of a substrate with a β-diketone metal complex in a gas phase; exposing molecule-attached surface to a nitrogen-hydrogen mixed plasma; and repeating the above steps, thereby accumulating atomic layers to form a single-metal film on the substrate.
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