High silicon content siloxane polymers for integrated circuits
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United States of America Patent
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Mar 13, 2012
Grant Date -
Aug 28, 2008
app pub date -
Feb 21, 2008
filing date -
Feb 22, 2007
priority date (Note) -
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Abstract
Thin films are disclosed that are suitable as thin films in IC's and for other similar applications. In particular, the invention concerns thin films comprising compositions obtainable by hydrolysis of two or more silicon compounds, which yield an at least partially cross-linked siloxane structure. The invention also concerns a method for producing such films by preparing siloxane compositions by hydrolysis of suitable reactants, by applying the hydrolyzed compositions on a substrate in the form of a thin layer and by curing the layer to form a high silicon content film.
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