Ophthalmological measuring apparatus

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United States of America Patent

PATENT NO 8136945
APP PUB NO 20090257025A1
SERIAL NO

12412167

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Abstract

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An opthalmological measurement apparatus (1) is proposed which comprises a first measurement system and a second measurement system. The first measurement system comprises a first light projection system for projection of a first light beam (2) through a cross-sectional part (4) of an eye (3). In addition, the first measurement system comprises image detection means, arranged in the Scheimpflug configuration with respect to the first light beam (2), for detection and storage of a cross-sectional image (30A) of at least one subregion of the cross-sectional part (4) which is illuminated by the first light projection system, from a first position outside the first light beam (2). The second measurement system comprises a second light projection system for projection of a second light beam onto the eye (3), and comprises a wavefront detector (19) for determination and storage of a wavefront profile of the second light beam reflected by the eye (3). The second measurement system allows the detection of extended measurement data which, in addition to cross-sectional images, also includes the wavefront profile, so that not only geometric eye parameters but also optical characteristics of the eye, in particular optical characteristics of the eye lens, can be determined on the basis of the detected measurement data.

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Patent Owner(s)

Patent OwnerAddress
SIS AG SURGICAL INSTRUMENT SYSTEMS2562 PORT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Rathjen, Christian Bremen, DE 110 894

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