Chemical precursor ampoule for vapor deposition processes
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United States of America Patent
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Apr 3, 2012
Grant Date -
May 6, 2010
app pub date -
Oct 31, 2008
filing date -
Oct 31, 2008
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus for generating a gaseous chemical precursor is provided and contains a canister having a sidewall, a top, and a bottom encompassing an interior volume therein, an inlet port and an outlet port in fluid communication with the interior volume, and an inlet tube extending into the canister and having an inlet end and an outlet end, wherein the inlet end is coupled to the inlet port. The apparatus further contains a gas dispersion plate coupled to the outlet end of the inlet tube, wherein the gas dispersion plate is at an angle within a range from about 3° to about 80°, relative to a horizontal plane which is perpendicular to a vertical axis of the canister.
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