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United States of America Patent

PATENT NO 8147593
APP PUB NO 20080078292A1
SERIAL NO

11659975

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Abstract

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An absorbing solution according to the present invention is an absorbing solution that absorbs CO2 or H2S in gas or both of CO2 and H2S. The absorbing solution is formed by adding desirably 1 to 20 weight percent of tertiary monoamine to a secondary-amine composite absorbent such as a mixture of secondary monoamine and secondary diamine. Consequently, it is possible to control degradation in absorbing solution amine due to oxygen or the like in gas. As a result, it is possible to realize a reduction in an absorption loss, prevention of malfunction, and a reduction in cost. This absorbing solution is suitably used in an apparatus for removing CO2 or H2S or both of CO2 and H2S.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI HEAVY INDUSTRIES LTD2-3 MARUNOUCHI 3-CHOME CHIYODA-KU TOKYO 100-8332

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirata, Takuya Hiroshima, JP 92 492
Iijima, Masaki Hiroshima, JP 130 2067
Mimura, Tomio Osaka, JP 37 798
Ogura, Kouki Osaka, JP 17 259
Takashina, Toru Hiroshima, JP 52 505
Tanaka, Hiroshi Hiroshima, JP 1051 11763
Yagi, Yasuyuki Osaka, JP 48 545

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