Method for easy-to-clean substrates and articles therefrom
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 17, 2012
Grant Date -
Dec 16, 2010
app pub date -
Oct 18, 2007
filing date -
Oct 20, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of forming an easy-to-clean metal or metallized substrate, the method comprising forming a layer comprising silicon, oxygen, and hydrogen on at least a portion of a surface of the substrate by plasma deposition; and applying an at least partially fluorinated composition comprising at least one silane group to at least a portion of a surface of the layer comprising the silicon, oxygen, and hydrogen; and an easy-to-clean article made by the method are disclosed.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully