US Patent No: 8,162,725
Number of patents in Portfolio can not be more than 2000
Abrasive, method of polishing target member and process for producing semiconductor device
Stats
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Apr 24, 2012
Issued date -
Jul 25, 2007
filing date -
11/878,504
serial no -
In Force
status
Importance
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Abstract
To polish polishing target surfaces of SiO2 insulating films or the like at a high rate without scratching the surface, the present invention provides an abrasive comprising a slurry comprising a medium and dispersed therein at least one of i) cerium oxide particles constituted of at least two crystallites and having crystal grain boundaries or having a bulk density of not higher than 6.5 g/cm3 and ii) abrasive grains having pores. Also provided are a method of polishing a target member and a process for producing a semiconductor device which make use of this abrasive.
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First Claim
Related Publications
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
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| 4,954,142 Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor | 202 | 1989 | |
| 5,527,423 Chemical mechanical polishing slurry for metal layers | 274 | 1994 | |
| 5,858,813 Chemical mechanical polishing slurry for metal layers and films | 165 | 1996 | |
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| 4,588,421 Aqueous silica compositions for polishing silicon wafers | 60 | 1985 | |
| 5,264,010 Compositions and methods for polishing and planarizing surfaces | 111 | 1992 | |
| 5,389,352 Oxide particles and method for producing them | 50 | 1993 | |
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| 6,221,118 Cerium oxide abrasive and method of polishing substrates | 44 | 1999 | |
| 6,863,700 Cerium oxide abrasive and method of polishing substrates | 12 | 2001 | |
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| 5,011,671 Ceric oxide with new morphological characteristics and method for obtaining same | 15 | 1988 | |
| 5,026,421 Polishing compositions based on cerium and process for the preparation thereof | 20 | 1989 | |
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| 5,697,992 Abrasive particle, method for producing the same, and method of use of the same | 35 | 1996 | |
| 5,804,513 Abrasive composition and use of the same | 71 | 1997 | |
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| 5,876,490 Polish process and slurry for planarization | 103 | 1997 | |
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| 5,891,205 Chemical mechanical polishing composition | 37 | 1997 | |
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| 5,997,620 Polishing composition | 40 | 1998 | |
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| 5,775,980 Polishing method and polishing apparatus | 51 | 1996 | |
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| 4,475,981 Metal polishing composition and process | 47 | 1983 | |
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| 5,653,775 Microwave sintering of sol-gel derived abrasive grain | 43 | 1996 | |
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| 5,766,279 Polishing agent, method for producing the same and method for polishing | 18 | 1996 | |
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| 7,192,461 High concentration silica slurry | 8 | 2003 | |
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| 5,260,249 Catalyst for purifying automotive exhaust gas | 46 | 1992 | |
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| 5,543,126 Process for preparing crystalline ceric oxide | 28 | 1995 | |
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| 5,772,780 Polishing agent and polishing method | 28 | 1995 | |
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| 5,994,260 Cerium oxide with pores having a lamellar structure, preparation method therefor and use thereof in catalysis | 21 | 1999 | |
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| 4,462,188 Silica sol compositions for polishing silicon wafers | 63 | 1982 | |
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| 4,959,113 Method and composition for polishing metal surfaces | 110 | 1989 | |
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| 6,120,571 Polishing agent for semiconductor and method for its production | 33 | 1998 | |
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| 6,039,631 Polishing method, abrasive material, and polishing apparatus | 9 | 1998 | |
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| 5,525,559 Preparation of mixed powders | 8 | 1995 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Oct 24, 2015 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Oct 24, 2019 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Oct 24, 2023 |
| Fee | Large entity fee | small entity fee | micro entity fee |
|---|---|---|---|
| Surcharge - 3.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |