Multi-step deposition control
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United States of America Patent
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Apr 24, 2012
Grant Date -
Dec 4, 2008
app pub date -
Jan 29, 2008
filing date -
May 31, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
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