Substrate transfer apparatus and vertical heat processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8167521
APP PUB NO 20090175705A1
SERIAL NO

12225920

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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The present invention restrains, during a transfer of a substrate, a central portion of the substrate from being warped by its own weight, which might be caused by a super-enlargement of a diameter of the substrate. A substrate transfer apparatus 18 includes: a support part 17 which is moved above a substrate w of a large diameter; and an upside grip mechanism 28 disposed on the support part 17, the upside grip mechanism 28 capable of supporting a peripheral portion of the substrate w from above. The support part 17 is provided with a non-contact sucking and holding part 30 having a suction hole 31 and a blow hole 32. The non-contact sucking and holding part 30 sucks and holds the substrate w in a non-contact manner, by blowing a gas onto the central portion of the upper surface of the substrate w and sucking the central portion to form an air layer 50 such that the central portion of the wafer w is not warped.

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First Claim

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hagihara, Junichi Nirasaki, JP 26 328
Kato, Hitoshi Nirasaki, JP 331 8374
Nakao, Ken Nirasaki, JP 50 1531

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