Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 8, 2012
Grant Date -
Oct 20, 2011
app pub date -
Jun 23, 2011
filing date -
Mar 5, 2008
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate compound in addition to water.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully