Composition and method for treating semiconductor substrate surface
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United States of America Patent
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May 8, 2012
Grant Date -
Apr 5, 2012
app pub date -
Dec 7, 2011
filing date -
Nov 17, 2009
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Abstract
The present invention is directed to compositions and method of use for treating semiconductor substrate comprising a sulfonium compound and a nucleophilic amine in the fabrication of electronic devices. Optionally, the said composition further comprises a chelating agent, and solvent. The pH of the said solution can be adjusted with the addition of acid or base. The semiconductor manufacturing processes include steps for post etch residue, photoresist removal and steps during chemical mechanical planarization and post chemical mechanical planarization.
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