Pattern displacement measuring method and pattern measuring device
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United States of America Patent
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May 8, 2012
Grant Date -
Jun 10, 2010
app pub date -
Feb 18, 2010
filing date -
Aug 31, 2006
priority date (Note) -
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Abstract
An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
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