High rate selective polymer growth on a substrate
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United States of America Patent
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May 22, 2012
Grant Date -
Sep 30, 2010
app pub date -
Mar 31, 2009
filing date -
Mar 31, 2009
priority date (Note) -
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Abstract
Method and systems provide growth of polymer structures at a high rate in a selective manner. In various embodiments, the method or system can expose the growth site to a polymer source and growing a polymer tube at a rate of at least 80 micrometer per hour at the growth site. The method or system can provide selectivity by providing a growth site on a substrate by patterning a metal, such as copper, that provides a seed site for the polymer. Non-selected sites can be coated with a polymer growth inhibitor, such as polyimide or silicon nitride.
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