Cleaning method by electrolytic sulfuric acid and manufacturing method of semiconductor device
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United States of America Patent
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May 29, 2012
Grant Date -
Dec 31, 2009
app pub date -
Jun 26, 2009
filing date -
Jun 30, 2008
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Abstract
The cleaning method by electrolytic sulfuric acid and the manufacturing method of semiconductor device comprising:
- the process in which the first sulfuric acid solution is supplied from outside to the sulfuric acid electrolytic cell to form the first electrolytic sulfuric acid containing oxidizing agent in the sulfuric acid electrolytic cell;the process in which the second sulfuric acid solution, which is higher in concentration than said the first sulfuric acid solution previously supplied, is supplied from outside to said sulfuric acid electrolytic cell; said the second sulfuric acid solution and the first electrolytic sulfuric acid are mixed in said sulfuric acid electrolytic cell; and electrolysis is performed to form the cleaning solution comprising the second electrolytic sulfuric acid containing sulfuric acid and oxidation agent in said sulfuric acid electrolytic cell and the process in which cleaning treatment is performed for the cleaning object with said cleaning solution.
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