US Patent No: 8,193,100
Number of patents in Portfolio can not be more than 2000
Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product
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Jun 5, 2012
Issued date -
May 19, 2009
filing date -
12/468,143
serial no -
In Force
status
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Abstract
A method of manufacturing an exposure mask includes generating or preparing flatness variation data relating to a mask blanks substrate to be processed into an exposure mask, the flatness variation data being data relating to change of flatness of the mask blank substrate caused when the mask blank substrate is chucked by a chuck unit of an exposure apparatus, generating position correction data of a pattern to be drawn on the mask blanks substrate based on the flatness variation data such that a mask pattern of the exposure mask comes to a predetermined position in a state that the exposure mask is chucked by the chuck unit, and drawing a pattern on the mask blanks substrate, the drawing the pattern including drawing the pattern with correcting a drawing position of the pattern and inputting drawing data corresponding to the pattern and the position correction data into a drawing apparatus.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
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| 6,537,844 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server | 20 | 2002 | |
| 6,727,565 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server | 5 | 2003 | |
| 7,060,519 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server | 7 | 2004 | |
| 7,384,713 Exposure mask blank manufacturing method and exposure mask manufacturing method | 2 | 2004 | |
| 7,351,504 Photomask blank substrate, photomask blank and photomask | 2 | 2004 | |
| 2005/0214,657 Method of generating writing pattern data of mask and method of writing mask | 10 | 2005 | |
| 7,435,609 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server | 2 | 2005 | |
| 7,474,386 Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method | 6 | 2007 | |
| 7,479,365 Semiconductor device manufacturing method | 2 | 2008 | |
| 2009/0227,112 EXPOSURE MASK MANUFACTURING METHOD, DRAWING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND MASK BLANKS PRODUCT | 2 | 2009 | |
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| 7,444,616 Method for error reduction in lithography | 19 | 2004 | |
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| 2007/0063,453 Vacuum chuck and suction board | 5 | 2006 | |
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| 2005/0240,895 Method of emulation of lithographic projection tools | 23 | 2005 | |
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| 7,344,808 Method of making photomask blank substrates | 4 | 2004 | |
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| 7,155,689 Design-manufacturing interface via a unified model | 139 | 2003 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
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| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Dec 5, 2015 |
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| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 5, 2023 |
| Fee | Large entity fee | small entity fee | micro entity fee |
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