Dual tone development processes
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United States of America Patent
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Jun 12, 2012
Grant Date -
May 13, 2010
app pub date -
Sep 16, 2009
filing date -
Sep 19, 2008
priority date (Note) -
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Abstract
A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.
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