Method of forming magnetic layer pattern, and method of manufacturing perpendicular magnetic recording head
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United States of America Patent
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Jun 19, 2012
Grant Date -
Apr 14, 2011
app pub date -
Dec 10, 2010
filing date -
Feb 22, 2006
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Abstract
Provided is a method of manufacturing a perpendicular magnetic recording head which can enhance accuracy and simplify the manufacturing process. The method includes: forming a photoresist pattern having an opening part; forming a non-magnetic layer so as to narrow the opening part by a dry film forming method such as ALD method; stacking a seed layer and a plating layer so as to bury the opening part provided with the non-magnetic layer; and forming a main magnetic pole layer by polishing the non-magnetic layer, the seed layer, and the plating layer by CMP method until the photoresist pattern is exposed. The final opening width is unsusceptible to variations, thus reducing the number of the steps of forming the main magnetic layer.
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