Template derivative for forming ultra-low dielectric layer and method of forming ultra-low dielectric layer using the same

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United States of America Patent

PATENT NO 8202807
APP PUB NO 20080214018A1
SERIAL NO

11964950

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Abstract

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A reactive cyclodextrin derivative or a reactive glucose derivative is used as a template derivative for forming an ultra-low dielectric layer. A layer is formed of the reactive cyclodextrin derivative or the reactive glucose derivative capped with Si—H and then cured in an atmosphere of hydrogen peroxide to form the ultra-low dielectric layer.

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HYNIX SEMICONDUCTOR INCGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Sang Tae Gyeonggi-do, KR 28 216
An, Hyeon Ju Gyeonggi-do, KR 14 106
Chung, Chai O Gyeonggi-do, KR 6 11
Kim, Chan Bae Seoul, KR 21 42
Kim, Eun Jeong Gyeonggi-do, KR 53 334
Ku, Ja Chun Gyeonggi-do, KR 12 110
Lee, Hyo Seok Gyeonggi-do, KR 12 33
Min, Sung Kyu Seoul, KR 7 22

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