Stitching of near-nulled subaperture measurements
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United States of America Patent
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Jun 19, 2012
Grant Date -
Oct 8, 2009
app pub date -
Apr 8, 2009
filing date -
Apr 8, 2008
priority date (Note) -
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Abstract
A metrology system for measuring aspheric test objects by subaperture stitching. A wavefront-measuring gauge having a limited capture range of wavefront shapes collects partially overlapping subaperture measurements over the test object. A variable optical aberrator reshapes the measurement wavefront with between a limited number of the measurements to maintain the measurement wavefront within the capture range of the wavefront-measuring gauge. Various error compensators are incorporated into a stitching operation to manage residual errors associated with the use of the variable optical aberrator.
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