Methods and systems for classifying defects detected on a reticle
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 19, 2012
Grant Date -
N/A
app pub date -
Feb 27, 2009
filing date -
Feb 27, 2009
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Methods and systems for classifying defects detected on a reticle are provided. One method includes determining an impact that a defect detected on a reticle will have on the performance of a device being fabricated on a wafer based on how at least a portion of the reticle prints or will print on the wafer. The defect is located in the portion of the reticle. The method also includes assigning a classification to the defect based on the impact.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully