Radioactive ray-curable liquid resin composition for use in optical stereolithography, and optically shaped article produced by curing the composition

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United States of America Patent

PATENT NO 8207239
APP PUB NO 20120041091A1
SERIAL NO

13317375

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Abstract

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The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.

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Patent Owner(s)

Patent OwnerAddress
COVESTRO JAPAN LTD1-7-6 SHIBAKOEN MINATOKU TOKYO 105-0011

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shinohara, Noriyasu Tokyo, JP 13 22
Takase, Katsuyuki Tokyo, JP 8 45
Tanabe, Takayoshi Tokyo, JP 51 663

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