Immersion lithography system using a sealed wafer bath

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO

8208116

APP PUB NO

20080106710A1

SERIAL NO

11670860

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus including a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly and comprising a seal ring for sealing a gap between a bottom edge of a wafer retained on the wafer stage and the wafer stage. The apparatus further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid; a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and at least one directional flow control fluid inlet surrounding the imaging lens for directing immersion fluid toward an edge of the wafer retained on the wafer stage closest to the imaging lens.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.HSIN-CHU14305

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Ching-Yu Yilang County, TW 250 1655
Lin, Burn Jeng Hsin-Chu, TW 104 1709

Cited Art Landscape

Patent Info (Count) # Cites Year
 
NIKON CORPORATION (6)
2005/0219,488 Exposure apparatus and method for producing device 89 2005
2005/0259,234 Exposure apparatus and device manufacturing method 309 2005
2007/0177,125 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate 36 2005
7483119 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 34 2005
2006/0146,306 Exposure apparatus, exposure method, and method for producing device 51 2006
* 2006/0232,757 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method 58 2006
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (5)
6788477 Apparatus for method for immersion lithography 287 2002
2005/0286,033 Immersion lithography system with wafer sealing mechanisms 14 2004
2007/0091,287 IMMERSION LITHOGRAPHY APPARATUS AND METHODS 36 2006
2008/0106,710 Immersion Lithography System Using A Sealed Wafer Bath 4 2007
2008/0106,715 Immersion Lithography System Using A Sealed Wafer Bath 12 2007
 
ASML NETHERLANDS B.V. (1)
7075616 Lithographic apparatus and device manufacturing method 187 2003
 
Canon Kabushiki Kaisha (1)
5610683 Immersion type projection exposure apparatus 863 1995
* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (1)
9046789 Immersion lithography system using a sealed wafer bath 0 2012
* Cited By Examiner

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