US Patent No: 8,208,116

Number of patents in Portfolio can not be more than 2000

Immersion lithography system using a sealed wafer bath

ALSO PUBLISHED AS: 20080106710

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Abstract

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Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus including a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly and comprising a seal ring for sealing a gap between a bottom edge of a wafer retained on the wafer stage and the wafer stage. The apparatus further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid; a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and at least one directional flow control fluid inlet surrounding the imaging lens for directing immersion fluid toward an edge of the wafer retained on the wafer stage closest to the imaging lens.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.HSIN-CHU9791

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Ching-Yu Hsinchu, TW 269 1078
Lin, Burn Jeng Hsin chu, TW 141 1096

Cited Art Landscape

Patent Info (Count) # Cites Year
 
NIKON CORPORATION (6)
2005/0219,488 Exposure apparatus and method for producing device 66 2005
2005/0259,234 Exposure apparatus and device manufacturing method 222 2005
2007/0177,125 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate 11 2005
7,483,119 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 18 2005
2006/0146,306 Exposure apparatus, exposure method, and method for producing device 37 2006
2006/0232,757 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method 47 2006
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (5)
6,788,477 Apparatus for method for immersion lithography 217 2002
2005/0286,033 Immersion lithography system with wafer sealing mechanisms 8 2004
2007/0091,287 IMMERSION LITHOGRAPHY APPARATUS AND METHODS 25 2006
2008/0106,710 Immersion Lithography System Using A Sealed Wafer Bath 4 2007
2008/0106,715 Immersion Lithography System Using A Sealed Wafer Bath 6 2007
 
ASML NETHERLANDS B.V. (1)
7,075,616 Lithographic apparatus and device manufacturing method 130 2003
 
CANON KABUSHIKI KAISHA (1)
5,610,683 Immersion type projection exposure apparatus 673 1995

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