US Patent No: 8,208,116
Number of patents in Portfolio can not be more than 2000
Immersion lithography system using a sealed wafer bath
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Jun 26, 2012
Issued date -
Feb 2, 2007
filing date -
11/670,860
serial no -
In Force
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Abstract
Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus including a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly and comprising a seal ring for sealing a gap between a bottom edge of a wafer retained on the wafer stage and the wafer stage. The apparatus further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid; a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and at least one directional flow control fluid inlet surrounding the imaging lens for directing immersion fluid toward an edge of the wafer retained on the wafer stage closest to the imaging lens.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
|---|---|---|---|
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| 2005/0219,488 Exposure apparatus and method for producing device | 48 | 2005 | |
| 2005/0259,234 Exposure apparatus and device manufacturing method | 144 | 2005 | |
| 2007/0177,125 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate | 8 | 2005 | |
| 7,483,119 Exposure method, substrate stage, exposure apparatus, and device manufacturing method | 10 | 2005 | |
| 2006/0146,306 Exposure apparatus, exposure method, and method for producing device | 29 | 2006 | |
| 2006/0232,757 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method | 32 | 2006 | |
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| 6,788,477 Apparatus for method for immersion lithography | 143 | 2002 | |
| 2005/0286,033 Immersion lithography system with wafer sealing mechanisms | 8 | 2004 | |
| 2007/0091,287 IMMERSION LITHOGRAPHY APPARATUS AND METHODS | 17 | 2006 | |
| 2008/0106,710 Immersion Lithography System Using A Sealed Wafer Bath | 2 | 2007 | |
| 2008/0106,715 Immersion Lithography System Using A Sealed Wafer Bath | 3 | 2007 | |
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| 7,075,616 Lithographic apparatus and device manufacturing method | 72 | 2003 | |
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| 5,610,683 Immersion type projection exposure apparatus | 518 | 1995 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Dec 26, 2015 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Dec 26, 2019 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 26, 2023 |
| Fee | Large entity fee | small entity fee | micro entity fee |
|---|---|---|---|
| Surcharge - 3.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |